Shulou(Shulou.com)12/24 Report--

Thanks to CTOnews.com netizen OC_Formula for the clue delivery! CTOnews.com December 7 news, Nikon official website issued a press release, announced the launch of infiltrating ArF lithography machine new product NSR-S636E, will go on sale in January next year.

According to reports, NSR-S636E is the most productive product in Nikon lithography system, and it is an infiltrating lithography machine for key layers.

Nikon says that with the acceleration of the digital transformation, high-performance semiconductors that can process and transmit large amounts of data faster are becoming more and more important. The key driving factors of cutting-edge semiconductor performance and technological innovation are circuit miniaturization and 3D semiconductor device structure, and ArF wetting lithography is very important to both manufacturing processes. Compared with traditional semiconductors, wafer warping and distortion are more likely to occur in 3D semiconductor manufacturing, so more advanced lithography machine correction and compensation capabilities are needed than ever before.

The NSR-S636E ArF lithography machine uses enhanced iAS (inline Alignment Station) to perform complex wafer multipoint measurements before exposure. This system uses high-precision measurement and extensive wafer warping and distortion correction functions to provide higher overlap accuracy while maintaining maximum throughput.

Nikon says NSR-S636E is 10-15 per cent more productive than current models.

CTOnews.com learned from the Nikon official website parameter table that the NSR-S636E lithography machine supports accuracy below 38nm and the throughput can reach 280wafers per hour.

According to a previous report by the Nikkei News, after more than 20 years, Nikon will launch new lithography products in 2024 to make a comeback by seeking to counter the trend and develop the Chinese mainland market. However, the I-ray lithography machine, not the infiltrating ArF lithography machine, is mentioned in the report.

Nikon and Canon dominated the market before the 1990s, but lost to ASML in the competition for the most cutting-edge extreme ultraviolet (EUV) devices, the report said. Extreme UV lithography will be put into practice in the second half of 2010, and only ASML can be produced in the world. On the other hand, Nikon's business resources are scattered in a variety of light sources, lack of strong areas.

Welcome to subscribe "Shulou Technology Information " to get latest news, interesting things and hot topics in the IT industry, and controls the hottest and latest Internet news, technology news and IT industry trends.