Shulou(Shulou.com)11/24 Report--

Thanks to CTOnews.com netizen knsgccxr for the clue delivery! CTOnews.com, October 15 (Xinhua)-- Intel China official account announced Friday night that Intel has recently begun mass production of Intel 4 process nodes using extreme Ultraviolet Lithography (EUV) technology. Officials say Intel is promoting the "four-year five process nodes" program with strong execution and will be used in a new generation of leading products.

According to reports, Intel 4 is the first process node produced by Intel using EUV technology, with "significant improvements" in performance, energy efficiency and transistor density. EUV technology will drive applications that require the highest computing power, such as AI, advanced mobile networks, autopilot and new data centers and cloud applications.

The progress of each process is as follows:

Mass production of Intel 7 and Intel 4 has been achieved, and Intel 3 is moving forward as planned, with a target of mass production by the end of 2023.

The Intel 20A and Intel 18A, which use RibbonFET full-surround gate transistors and PowerVia back power technology, are also "going well" with a target of 2024.

The Intel Core Ultra processor, codenamed Meteor Lake, was released on December 14 this year and uses Intel 4 process nodes.

The Xeon processor Sierra Forest will be available in the first half of next year, with an energy-efficient core (E-core) that uses Intel 3 process nodes.

The Xeon processor Granite Rapids will also be available in the first half of next year, immediately after Sierra Forest, with a high-performance core (P-Core).

CTOnews.com previously reported that Intel introduced the Intel 4 process at the ON Technology Innovation Summit held in September.

Intel said that compared with lntel 7, Intel 4 has twice the size, brings a high-performance logic library, and introduces a number of innovations:

EUV Lithography with simplified process

Lntel 4 is optimized for high performance computing applications to support low voltage (

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