Shulou(Shulou.com)11/24 Report--

On June 26, driven by Samsung Electronics' attempt to restructure the EUV photoresist supply chain, the EUV resist developed by Dongjin Shimeken was used in one of their mass production lines at the end of last year.

The latest reports from relevant media show that the developed extreme ultraviolet photoresist has entered the Dongjin Macon of Samsung Electronics production line, and is also preparing to develop a photoresist for the next generation of extreme ultraviolet lithography machine, that is, the extreme ultraviolet lithography machine (high-NA EUV) with high numerical aperture.

The relevant media said in the report that Dongjin Miken developed the photoresist needed after the production of the high numerical aperture extreme ultraviolet lithography machine in order to meet the demand after a large number of extreme ultraviolet lithography machines such as Asma were put into production.

Asmai high numerical aperture extreme ultraviolet lithography machine, after the launch of TWINSCAN NXE:3400C, TWINSCAN NXE:3600D and other models of extreme ultraviolet lithography machine, the new generation of products, will continue to use the name of the EXE series, there are two models TWINSCAN EXE:5000 and TWINSCAN EXE:5200.

Asmai high numerical aperture of the extreme ultraviolet lithography machine, numerical aperture will be increased from 0.33 to 0.55, for 2nm and below the process process, the first to be handed over to the customer for process research and development products, is scheduled to be shipped at the end of this year, for mass production, is expected to start full operation in the customer's factory in 2025.

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