Shulou(Shulou.com)11/24 Report--

CTOnews.com, December 25 (Xinhua)-- Intel is a staunch advocate of Moore's Law. Although the technical indicators of each generation of processes are excellent, they do lag behind TSMC and Samsung Electronics in progress.

At present, Intel's 12th and 13th generation processors are still using Intel 7 technology (former 10nm Superfin), while next year's Meteor Lake will use a new generation of Intel 4 technology (former 7nm).

Intel 4 will be Intel's first FinFET process based on EUV EUV technology, with a 20% increase in performance per watt, while Meteor Lake is scheduled to stream in the fourth quarter of this year and ship in 2023.

Intel 4 was followed by Intel 3, the last generation of FinFET-based technology, with an 18% increase in performance per watt, which had been planned to start production in the second half of 2023.

Then there is Intel 20A process, when Intel will also abandon FinFET technology and turn to GAA route. 20A will adopt two breakthrough technologies-- PowerVia and RibbonFET, the former is the original power supply technology of Intel, and the latter is a new breakthrough based on GAA technology, which is expected to come out in 2024.

The technology under development in 2025 and beyond, named Intel 18A, will continue to improve RibbonFET technology and will use ASML's next generation of high-NA EUV lithography machines, but the timing of mass production is uncertain.

Intel now announces that its first large-capacity EUV lithography machine in Europe has been launched at the Fab 34 plant in Ireland and has successfully produced a 13.5nm wavelength light source.

Earlier this year, an EUV lithography machine was introduced at the Fab 34 plant in Ireland, which is a key driver of Intel4 technology.

Intel said the system, made by ASML in the Netherlands, is arguably the most complex machine ever built by mankind. The local team has been installing and debugging the new EUV lithography machine since it was delivered, and this week ushered in an important moment when Intel officially launched the EUV lithography machine, and 25KW's laser successfully excited the 13.5nm wavelength EUV source after a series of complex operations.

This is an important milestone on the road of mass production of Intel4 technology, and it is also the first time in Europe to use a high-capacity EUV lithography machine.

According to reports, the EUV system consists of more than 100000 parts, 3000 cables, 40,000 bolts and more than a mile of hoses. Since it arrived in Lex Lip, the local team has been trying to produce the first beam of light, but the process is very complicated because it depends on the complex technology of many factors. whether it is the lithography machine itself or the identification of the overall facility system and the connection to the utility, it takes a team to achieve, even before it took 18 months to build the manufacturer and prepare the facility.

In the process, more than 100 ASML employees have worked with a team of contractors, Intel engineers and technicians to build and deploy, and it is expected that Intel 4 technology will be ready for mass production in the coming period.

For a series of content about Meteor Lake, please see the previous report by CTOnews.com.

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