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ASML: the number of EUV equipment production will exceed 50 this year, and the High-NA EUV mass production model will be launched at the end of 2024 or early 2025.

2025-03-28 Update From: SLTechnology News&Howtos shulou NAV: SLTechnology News&Howtos > IT Information >

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CTOnews.com, December 9, according to The Elec, ASML recently pointed out at the 2022 Semiconductor EUV ecosystem Global Conference that the number of EUV equipment produced by ASML has increased from 22 in 2019 to 42 in 2021, is expected to exceed 50 this year, and will further increase next year. The initial version of the High-NA EUV device will be launched at the end of next year, and the mass production model will be launched at the end of 2024 or early 2025.

In the third quarter earnings announcement on October 19, ASML said: "in the EUV High-NA business, ASML has received additional orders from TWINSCAN EXE:5200; currently all EUV customers have submitted High-NA orders." The High-NA EUV device is a device that increases the lens numerical aperture (NA) of light collection capacity from 0.33 to 0.55. Handle more elaborate semiconductor circuits than existing EUV devices. Most people in the industry believe that High-NA equipment is very important to the 2nm process.

According to etnews, Samsung Electronics and SK Hynix have ordered the next generation semiconductor device High-NA extreme Ultraviolet (EUV) exposure device from lithography giant ASML. After TSMC and Intel, South Korean semiconductor manufacturers are also preparing to introduce equipment that can implement 2nm processes. Competition for the most advanced processes is expected to intensify.

CTOnews.com learned that High-NA EUV equipment is more expensive than the EUV equipment currently in use, but it can implement hyperfine processes (single patterning) at one time, which can greatly increase productivity. As far as Samsung Electronics is concerned, it is necessary to ensure that High-NA EUV devices are used in 2nm mass production after 3nm mass production. Existing EUV equipment is estimated to cost 200 billion won (about 1.008 billion yuan) to 300 billion won (about 1.512 billion yuan), while High-NA EUV equipment is estimated to cost 500 billion won (about 25.02 billion yuan).

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