Shulou(Shulou.com)11/24 Report--

Thanks to CTOnews.com netizen kinja for the clue delivery! CTOnews.com November 26 news, According to China Optical Valley, Hubei TV and other reports, Huazhong University of Science and Technology professor Liu Shiyuan founded Yuwei Optical Software Co., Ltd.(referred to as "Yuwei Optics"), Has successfully developed the national production, Independent controllable computational lithography OPC software, Fill the domestic gap. At present, integration and testing are being done, and verification is done by chip manufacturers. Wuhan Optoelectronic Industry Research Institute, which incubates enterprises, will also provide technology transformation services.

OPC software, or "optical proximity correction software," is a chip design tool EDA, without which, even with the use of lithography machine, but also can not make chips.

According to Liu Shiyuan, lithography is one of the most critical processes in chip manufacturing. Through lithography imaging system, the designed pattern is transferred to silicon wafer. As the chip size continues to shrink, the exposure pattern on the silicon wafer becomes distorted. Before the photolithographic fabrication of chips below 90nm or even 180nm, a class of algorithmic software called OPC (Optical Proximity Correction) must be optimized. Without OPC, all IC manufacturers would lose the ability to turn chip designs into chip products.

Liu Shiyuan is a professor and doctoral supervisor of School of Optics and Electronic Information and School of Mechanical Science and Engineering of Huazhong University of Science and Technology; Director of Integrated Circuit Measurement Equipment Research Center of Huazhong University of Science and Technology, and Director of Integrated Circuit Measurement and Testing Technology Innovation Center of Optical Valley Laboratory. In his early years, he studied under Academician Yang Shuzi, former president of Huazhong University of Science and Technology and famous machinist. In 1998, he received a doctor's degree in engineering.

Liu Shiyuan joined Shanghai Microelectronics Equipment Co., Ltd.(SMEE) in 2002 to undertake the research and development task of "100nm Lithography Machine," a major national 863 project. He is a member of the overall team and the head of the control discipline. Liu Shiyuan established SMEE's first control engineering laboratory, which solved the technical problems of synchronous control of mask stage, workpiece stage and exposure dose in scanning projection lithography machine.

In October 2020, Liu Shiyuan founded Yuwei Optics Company. At present, except for 2 administrative staff, all the team members are R & D personnel from China, the United States, Russia and other different countries. They are top technical experts in relevant fields. More than 30% of the members have doctoral degrees and rich industry experience. Finally, the OPC software algorithm is created independently and controllable.

CTOnews.com learned that Yuwei Optics recently announced the completion of the Pre-A round of tens of millions of yuan financing. After the completion of this round of financing, Yuwei Optics will further strengthen the integration and software productization of each core module, and calibrate, test and verify various software parameters. In the next step, Yuwei Optics will accelerate the pace of product promotion, accelerate its entry into the domestic and foreign chip manufacturer markets, and strive to become an important link in the global chip industry chain.

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