Shulou(Shulou.com)11/24 Report--

CTOnews.com October 22 news, according to the Russian Nizhny Novgorod Strategic Development Agency documents, the Russian Academy of Sciences Nizhny Novgorod Institute of Applied Physics (IPF RAS) is developing Russia's first set of semiconductor lithography equipment, and boasted: this lithography machine can use 7nm to produce chips, can be fully put into production in 2028.

According to reports, they plan to build an industrial prototype of the lithography machine within six years, starting with the development of an alpha machine in 2024. The focus of this stage is not on the high speed of its work or solution, but on the comprehensiveness of all systems.

Then, by 2026, alpha should be replaced by Beta. At that time, all systems will be improved and optimized, resolution will also be improved, productivity will also be improved, and many operations will be mechanically automated. At this stage, it is important to integrate it into the actual technical process and debug it by "pulling" equipment suitable for other production stages.

The third and last step will bring stronger light source, improved positioning and feeding system to the lithography machine, and make this lithography system work quickly and accurately.

CTOnews.com has reported that Russia is now able to produce 65nm chips after announcing a national plan to develop the 28nm process in 2030, reverse-engineering foreign chips and training local semiconductor talent.

ASML, the global lithography leader, has been working on EUV exposure machines for nearly 20 years, with the goal of keeping the world's top semiconductor manufacturers extremely efficient, said the deputy director of the Institute of Nanostructure of the Russian Academy of Sciences. But Russia does not need it, as long as it moves forward according to its domestic needs.

From the evaluation of other foreign media, Russia's idea seems to be too naive. After all, it is a bit hard to believe that we want to develop a lithography technology within 6 years that is comparable to ASML's ten-year accumulation, and wafer factories do not rely solely on lithography machines to produce chips, but also need a lot of peripheral equipment, and Russia does not meet the conditions for independent production of these devices.

It is worth mentioning that the Nizhny Novgorod delegation also showed you demonstration samples of future lithography equipment. The system is based on the development, manufacture and installation of IAP RAS in Nizhny Novgorod. But they themselves mentioned that this is not even a device prototype, but a "prototype of the prototype".

Although this demonstration equipment does not solve practical industrial problems, it gives scientists the opportunity to verify the feasibility of key technologies and test other key assumptions needed for further work.

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