Shulou(Shulou.com)11/24 Report--

CTOnews.com, August 22, China Micro Corporation announced today that the 2000 reaction station of its capacitively coupled high energy plasma (CCP) etching equipment has been successfully shipped to a domestic semiconductor manufacturer.

China Micro Corporation pointed out that the CCP etching equipment reaction stations shipped in this batch have Primo AD-RIE and Primo HD-RIE series products. Among them, Primo AD-RIE-e is a sub-product of the second generation dielectric etching product Primo AD-RIE, which will be used in the development and mass production of mask etching of front and middle segments up to 5 nm.

The Primo HD-RIE delivery batch has a system of six single reactor cavities, which is positioned to provide a comprehensive solution for medium-to-high aspect ratio etching. According to China Micro Corporation, Primo HD-RIE has excellent performance in high aspect ratio grooves and deep hole etching in 3D-NAND and DRAM, and has achieved mass production in some key processes.

CTOnews.com learned that data show that the amount of new orders signed by China Micro Corporation in the first half of 2022 increased by 61.83% year-on-year to 3.057 billion yuan, operating revenue increased by 47.30% year-on-year to 1.972 billion yuan, and non-parent net profit increased by 615.26% to 441 million yuan, of which etching equipment revenue was 1.299 billion yuan, an increase of about 51.48% over the same period last year.

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