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This article mainly introduces the differences between euv and duv, the article is very detailed, has a certain reference value, interested friends must read it!

The difference between euv and duv: 1. Duv can only achieve 25nm, while euv can meet the wafer weight manufacturing below 10nm; 2. Duv mainly uses the refraction principle of light, while the reflection principle of light used by euv must be operated in vacuum.

The difference between euv and duv:

1. The range of manufacturing process is different

Duv: basically can only achieve 25nm Intel with dual workbench mode to achieve 10nm, but can not reach below 10nm.

Euv: can meet the wafer right manufacturing below 10nm, and can also be extended to 5nm and 3nm.

2. the principle of luminescence is different.

Duv: the light source is excimer laser. The wavelength of the light source can reach 193nm.

Euv: laser excites plasma to emit EUV photons, and the wavelength of the light source is 13.5nm.

3. Different optical systems

Duv: mainly uses the principle of refraction of light. Among them, the immersion lithography is filled with deionized water between the projection lens and the wafer, so that the light wave of 193nm is equivalent to 134nm.

Euv: using the reflection principle of light, the interior must be operated in vacuum.

The above is all the content of the article "what's the difference between euv and duv". Thank you for reading! Hope to share the content to help you, more related knowledge, welcome to follow the industry information channel!

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